Megasonic ultrasonic cleaning is a kind of acoustic cleaning related to ultrasonic cleaning. This is a mild cleaning mechanism, which can hardly damage the object to be cleaned. It is also used for cleaning wafers, medical implants and precision industrial parts.

      Similar to the low-frequency ultrasonic cleaning, the megasonic cleaning machine uses a transducer usually located on the top of the piezoelectric substrate. Compared with ultrasonic cleaning (20-200 kHz), the transducer generates sound field at a higher frequency (usually 0.8-2 MHz). As a result, the cavitation that occurs becomes mild and much smaller. At present, megasonic cleaning machine is mainly used in electronic industry to prepare silicon wafer.